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EIA JESD 202:2006
EIA JESD 202:2006
Method for Characterizing the Electromigration Failure Time Distribution of Interconnects Under Constant-Current and Temperature StressThis is an accelerated stress test method for determining sample estimates and their confidence limits of the median-time-to-failure, sigma, and early percentile of a log-Normal distribution, which are used to characterize the electromigration failure-time distribution of equivalent metal lines subjected to a constant current-density and temperature stress. Failure is defined as some pre-selected fractional increase in the resistance of the line under test. Analysis procedures are provided to analyze complete and singly, right-censored failure-time data. Sample calculations for complete and right-censored data are provided in Annex A. The analyses are not intended for the case when the failure distribution cannot be characterized by a single log-Normal distribution.
Author | EIA |
---|---|
Editor | EIA |
Document type | Standard |
Format | File |
ICS | 19.040 : Environmental testing
31.020 : Electronic components in general |
Number of pages | 38 |
Year | 2006 |
Document history | |
Country | USA |
Keyword | EIA 202;202;EIA JESD202 |